ULTRATRON™ ADVANCED OXIDATION PROCESS UV SYSTEMS

ULTRATRON™ AOP SERIES CAN BE UTILIZED WITH HYDROGEN PEROXIDE, OZONE OR CHLORINE

COMPACT LAMP ARRANGEMENT WITH ULTRAWIPER™ MOTOR

SINGLE OR MULTIPLE LAMP CONFIGURATION

STURDY AND RELIABLE ULTRAWIPER™ QUARTZ WIPING SYSTEM

ULTRAWIPER™ WIPING BRUSH FOR UV SENSOR WINDOW

ROBUST, HYDROLICALLY OPTIMIZED REACTOR

ULTRATRON™ CAN BE INSTALLED INTO THE TIGHTEST PLACES

INTRODUCTION

ULTRATRON™ ADVANCED OXIDATION PROCESS UV SYSTEMS

Advanced Oxidation Processes (AOP) is a common name for chemical/photochemical reactions that generate OH-radicals in the water, with the purpose of degrading persistent and toxic chemical compounds. Typical examples of UV based advanced oxidation processes are UV/Hydrogen Peroxide, UV/Chlorine, UV/Ozone, UV/Persulfate, and Vacuum-UV.

OH-radicals react fast with most organic compounds in second-order reactions, resulting in complex radical chain reactions that often lead to mineralization of the organic compounds with CO2 and water as end products. AOP is frequently employed as a final polishing step in many water treatment applications, to provide combined disinfection and removal of trace organic compounds to very low levels, thus ensuring water of very high purity.

ULTRAAQUA UV provides the most efficient and customized AOP solutions using advanced integrated CFD, UV fluence field, and radical chemistry process models with the purpose of calculating and optimizing the space-dependent OH-radical concentration and prediction of the target compound degradation.

The result is a selection of reaction system, lamp type, and optimal reactor design to ensure an efficient treatment process that takes into account the physicochemical characteristics of the water matrix and target compounds. With highly complex water matrices, empirical target compound degradation can be obtained experimentally in ULTRAAQUA’s high-quality research laboratory.

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Key highlights

  • Guaranteed target compound(s) removal
  • Integrated CFD, UV fluence field and radical chemistry model optimized reactor design
  • Experimental validation of process efficiency as input to design
  • Optimal chemical utilization through CFD and UV fluence field optimized hydraulic conditions
  • Highest Energy Efficiency in AOP solution design
  • ULTRAWIPER™ – automated quartz sleeve wiping system
  • High-grade electropolished stainless-steel SS316 and Super duplex materials for corrosive environments
System Characteristics
Reactor configuration Inline, U-shape
Material Electropolished SS 316L, Super duplex
Inlet/outlet connection DN100 (4”) – DN1200 (48”) DIN, ANSI
Pressure rating Max. 16 bar
Flowrates 5 m3/h (22 GPM) – 6000 m3/h (38 MGD)
UV transmission (UVT%) 60 – 100%
Lamp type ULTRATRON™ Medium-pressure High Intensity (MPHI))
Lamp lifetime Guaranteed 9 000 hours
Control cabinet characteristics
Enclosure material Painted steel, SS304, SS316L, GFRP
UV intensity sensor ÖNORM certified, 360 degrees
Sleeve wiping Manual, automatic ULTRAWIPER™
SCADA connection Profibus, Profinet, MODBUS TCP/IP
Enclosure rating IP54, IP65
Lamp driver type Electronic variable output
System voltage 1x230V, 3x400V+N+Pe +/- 10%, 47-63Hz (other optional)
UV dose pacing Optional
CASES

CARLSBERG BREWERY IN DENMARK

“We would like to thank fellow members of DRIP partnership, the Innovation Fund Denmark, the Carlsberg Group, and Søren Nøhr Bak, Expertise Director at Niras for thinking ahead of their time.”

Ole Grønborg, ULTRAAQUA UV Disinfection Systems Director, M.Sc.

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APPLICATIONS

VERSATILITY EMBEDDED

ULTRAAQUA UV designs and develops systems which are suitable for several applications. All ULTRAAQUA UV units can be integrated into a wide range of different solutions. Please click below to learn more about additional applications where the ULTRAAQUA UV system can be applied.

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